Large-Scale Single-Crystal Diamond Growth via DC CVD ID: 2022-041
This technology revolutionizes diamond manufacturing by enabling the growth of single-crystal diamonds over large areas using direct current chemical vapor deposition.
Photo by JT Jeeraphun - stock.adobe.com
Photo by JT Jeeraphun - stock.adobe.com
Technology Overview:
The invention details a novel process for growing single-crystal diamonds on substrates larger than 100 mm in diameter, overcoming the limitations of microwave CVD methods. By utilizing a direct current chemical vapor deposition (DC CVD) technique, this method achieves unparalleled control over plasma conditions and substrate temperatures, facilitating the growth of high-quality diamonds on a scale previously unattainable.
Key Advantages
- Enables the growth of single-crystal diamonds on large substrates up to 150 mm or beyond.
- Improves diamond quality through enhanced plasma and temperature control.
- Supports the growth of high-purity and doped diamonds, offering versatility in applications.
- Compatible with a variety of substrate materials, including silicon and gallium nitride.
Problems Solved
- Overcomes the challenges of plasma homogeneity and temperature control in large-scale diamond growth.
- Eliminates the limitations of microwave CVD methods for scaling up diamond production.
- Provides a solution for producing high-quality, large-area single-crystal diamonds.
Market Applications
- Semiconductor industry for electronic and photonic devices.
- Manufacturing of high-performance optical components.
- Production of specialized cutting and drilling tools.
- Creation of heat sinks and thermal conductors for advanced electronics.
Stage of Development
N/A
Additional Information
Technology ID: 2022-041
Sell Sheet: Download the Sell Sheet here
Marketing Analysis: Link to Market Analysis here
Date Published: March 18, 2025
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