High Aspect Ratio Millimeter-Tall Free-Standing Carbon Nanotube Post Arrays Fabrication Method ID: 2015-062
This technology introduces an innovative method for fabricating straight, high aspect ratio millimeter-tall free-standing carbon nanotube (CNT) post arrays.
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Technology Overview
The method employs carbon-nanotube-templated microfabrication with a sacrificial hedge, alongside non-directional and directional plasma etching, to overcome the challenge of bending in tall CNT posts. This process facilitates the growth of straight, high aspect ratio CNT posts that can stand freely without support, marking a significant advancement in the field of microfabrication.
Key Advantages
- Enables the creation of straight, millimeter-tall CNT posts with high aspect ratios
- Removes sacrificial CNT hedges up to 5 microns thick, allowing for the growth of dense, patterned CNT arrays without a mask during plasma etching
- Offers a unique solution to the bending problem in tall CNT posts, ensuring structural integrity and uniformity
- Applicable to a wide range of fields, including MEMS, nano-electrodes for DNA detection, and biosensors
Problems Addressed
- Difficulty in growing straight, tall CNT posts that tend to bend as their aspect ratio increases
- Challenges in removing sacrificial CNT hedges to support dense CNT array growth
- Lack of efficient methods to fabricate high aspect ratio free-standing CNT post arrays for advanced applications
Additional Information
Technology ID: 2015-062
Sell Sheet: Download the Sell Sheet here
Market Analysis: Contact us for a more in-depth market report
Date Published: 28 March, 2025
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