Advanced Plasma Generation Technology ID: 2023-040
An innovative anode and cathode system designed to significantly enhance plasma generation efficiency and stability for various direct-current applications
Photo by hakule
Photo by hakule
Technology Overview:
This technology presents a novel design for an anode and cathode system aimed at improving direct-current plasma generation. It is specifically tailored for applications such as DC-PVD, DC-CVD, and DC-ALD. The system is engineered to provide larger growth areas, increased plasma stability, and reduced operational costs, benefiting a range of industries including metal sputtering for electronics and jewelry, optical component coating, and material deposition processes.
Key Advantages
- Enhanced plasma generation efficiency and stability
- Modular design for cost-effective component replacement
- Use of corrosion-resistant materials and advanced cooling methods
- Adjustable anode-cathode spacing for precise electric field control
Supports automated operation with integrated monitoring components
Problems Solved
- Inconsistent plasma stability and limited growth areas in current DC applications
- High operational costs due to non-modular component designs
- Difficulty in achieving precise control over the electric field during processing
Market Applications
- Metal sputtering for electronics and jewelry manufacturing
- Coating of optical components
- Deposition processes for advanced materials like diamond-like-carbon and graphene
Stage of Development
N/A
Additional Information
Technology ID: 2023-040
Sell Sheet: Download the Sell Sheet here
Marketing Analysis: Link to Market Analysis here
Date Published: March 18, 2025
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